EVAP1: E-Beam Metal Evaporator

Model: CHA Industries Solution E-Beam
Location: 1505 Fitzpatrick CIEMAS
Tool Group and Rate: Clean Room - $36.1/$72.2 per hour

Training Request Training for EVAP1 Training Checklist for EVAP1 Operating Procedures EVAP1 Operating Procedure EVAP1 Run Sheet Helpful Links CHA Industries Solution

The CHA Solution electron beam (E-Beam) evaporator process development system is a small-scale vacuum deposition system designed for small lot processing and engineered to handle a wide range of deposition needs. Its fully water cooled stainless steel chamber allows for flexibility in optimizing process start temperatures. Included in this system is CHA’s SmartSource electron beam gun with motor driven crucible rotation and lift lid. Neodymium magnets are used in the SmartSource gun for strength that is not compromised by repeated gun cleanings and turret changes. It features a unique, interlocking crucible cover that prevents cross-contamination of source materials between its pockets during evaporation. The entire system is monitored and controlled with PLC automation with touchscreen interface.

Applications	Electron Beam (E-Beam) thin metal film evaporation from up to 4 independent sources Metals available: Ag Au Co Cr Ge Mo Ni Pd Ti
Domes & Sample Sizes	Dome for holding  2 inch and/or 3 inch back loaded substrates positioned 90 degrees to the source Dome for two 6 x 6 inch square back loaded substrates positioned 90 degrees to the source ALL DOMES have chip holders for substrate pieces
Chamber Specifications	Water cooled SmartSource electron beam gun 4 x 25cc material source pockets  Source distance: 15 inches  Chamber volume: 4.5 cubic feet
Control	PLC automation with touchscreen Manual or automatic operational modes Maxtek rate and thickness deposition controller integrated for control of shutter and electron beam power supply