SPUT2: RF Dielectric Sputter System

Model: Kurt Lesker PVD 75
Location: 1505 Fitzpatrick CIEMAS
Tool Group and Rate: Clean Room - $36.1/$72.2 per hour

Training Request Training for SPUT2 Training Checklist for SPUT2 Operating Procedures Operating Procedure for SPUT2 Helpful Links Kurt J. Lesker website

The PVD 75 RF sputter system features a modular design for deposition of a variety of dielectric materials.  The system has manual controls allowing for a wide range of processing options.  An optical monitor provides the option for deposition monitoring of optical films at multiple wavelengths in the VIS or IR spectrums. Up to 3 separate films can be deposited sequentially.

Applications	RF sputtering of up to 3 different materials Materials currently available: ITO(in location 1) SiO2 (in location 2) Si3N4(in location 3)
Features	Optical thickness monitoring at multiple wavelengths in the VIS or IR spectrums RF bias of substrate Substrate heating Subtrate rotation to improve uniformity Argon and oxygen gases Touch screen interface PID loop pressure control D-shape 304 stainless steel chamber
Specifications	Ability to process up to 150mm samples 600W RF source with auto-tuning matching network 100W RF sample bias source Substrate temperature control up to 350C Three 3-inch sputter targets