SPUT3: DC Sputter System

Model: Kurt Lesker PVD 75
Location: 1505 Fitzpatrick CIEMAS
Tool Group and Rate: Clean Room - $36.1/$72.2 per hour

Training Request Training for SPUT3 Training Checklist for SPUT3 Operating Procedures Operating Procedure for SPUT3 Helpful Links Kurt J. Lesker website

The PVD 75 DC sputter system features a modular design for deposition of a variety of metallic materials.  The system has manual controls allowing for a wide range of processing options.  A crystal monitor provides the option of measuring film thinkness and depotision rate during the process if desired. Up to 3 separate films can be deposited sequentially.

Applications	DC sputtering of up to 3 different materials Materials currently available: Ti (in location 1) Cr (in location 2) Al (in location 2) Au (in location 3)
Features	RF bias of substrate Substrate heating Subtrate rotation to improve uniformity Argon sputter gas Touch screen interface PID loop pressure control D-shape 304 stainless steel chamber
Specifications	Ability to process up to 150mm samples 100W RF sample bias source Substrate temperature control up to 350C Three 3-inch sputter targets