PHOTO2: Frontside/Backside Mask Aligner

Model: Karl Suss MA6/BA6
Location: 1505 Fitzpatrick CIEMAS
Tool Group and Rate: Clean Room - $36.1/$72.2 per hour

Training Request Training for PHOTO2 Training Checklist for PHOTO2 Operating Procedures PHOTO2 Operating Procedure Baseline Photolithography Processes Mask Cleaning Procedures Helpful Links Karl Suss MA6/BA6 website

The MA6 Mask Aligner is designed for high-resolution photolithography in a laboratory environment. It also offers Backside Align capability with automated image capture and computer display optics.  All operating controls are laid out in a simple, ergonomic design, making the operation of the aligner easy to learn and providing the versatility needed in specialized processes.  Optics are on screen, with no eyepiece

The MA6 is equipped with a 350W lamp house containing a  350W mercury short-arc lamp. Primary exposure wavelengths are 350-450nm.  The aligner can perform exposures in hard contact mode, soft contact mode, proximity mode, and vacuum contact mode. Line/space resolution of <1.0 microns and alignment accuracies of 0.25 microns can be obtained with the MA6  under optimum conditions.

 

The MA6 is also equipped with a constant intensity controller (CIS) which regulates the lamp power to deliver constant intensity exposures.

The MA6 is capable of running samples ranging in size from 10mm to 150mm.  The mask holders can be used with masks ranging in size from 4" to 7" sq.  Minimum mask thickness is .09".

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