FURN2-Tube3: Low Temp Anneal and High Temp Anneal for P-type doping

Model: Tempress 6304 4-Stack Furnace
Location: 1505 Fitzpatrick CIEMAS
Tool Group and Rate: Clean Room - $36.1/$72.2 per hour

Training Request Training for FURN2-Tube3 Operating Procedures Contact SMIF if you are interested in using this furnace.  This equipment is operated by SMIF staff only. All samples must be approved by SMIF and go through SMIF approved cleaning prior to processing

Applications	Low temperature annealing (400C-600C) in N2 or Forming Gas High temperature annealing (up to 1050C) in N2 of P-type substrates
Features	Capable of handling small pieces up to 4" wafers (6" possible with additional boats)
Specifications	Temperature range: 400C - 1050C N2 or Forming Gas (H2/N2) ambient  for low temp annealing N2 for high temp annealing of P-type substrates