Cleanroom

Location: 1505 Fitzpatrick CIEMAS

CODE	EQUIPMENT	MODEL	APPLICATIONS
ACIDHOOD1	Small Acid Chemical Hood	Air Control Acid Hood	For acid chemical processing
ACIDHOOD2	Large ADA Acid Chemical Hood	Air Control Acid Hood	For acid chemical processing
ASH1	Plasma Asher	Emitech K-1050X	O2 / Ar plasma ashing of photoresist and other organic materials
BIOHOOD1	Biological Hood
BIOHOOD2	Biological Hood
COATHOOD1 -A-	Spin Coat Hood (left spinner) - RESIST ONLY	Air Control Spin Coat Hood	For spin coating photoresist and EBL resists ONLY
COATHOOD1 -B-	Spin Coat Hood (right spinner) - RESIST ONLY	Air Control Spin Coat Hood	For spin coating photoresist and EBL resists ONLY
COATHOOD2 -A-	Spin Coat Hood (left spinner) - ANY MATERIAL	Air Control Spin Coat Hood	For spin coating materials
COATHOOD2 -B-	Spin Coat Hood (right spinner) - ANY MATERIAL	Air Control Spin Coat Hood	For spin coating materials
DEVHOOD1 -A-	Develop Hood (left side)	Air Control Develop Hood	For photoresist  base develop processing
DEVHOOD1 -B-	Develop Hood (right side)	Air Control Develop Hood	For photoresist  base develop processing
EBL1	E-Beam Lithography System	Elionix ELS-7500 EX E-Beam Lithography System	Electron Beam Lithography and SEM imaging
ELL1	Ellipsometer	Rudolph Auto EL III	Thickness and index of refraction measurements of thin oxide, nitride, and organic films and optical constants of substrates.
EVAP1	E-Beam Metal Evaporator	CHA Industries Solution E-Beam	Deposition of thin metal films
EVAP2	E-beam & Thermal Metal Evaporator	Kurt Lesker PVD 75	E-beam and thermal evaporation of metal films
FLIP1	Flip Chip Bonder	Karl Suss FC150	Flip-chip bonding applications
FURN2-Tube1	High Temperature Anneal N-type doping	Tempress 6304 4-Stack Furnace	High Temperature Annealing (750C-1050C) in Nitrogen used for N-type doped substrates
FURN2-Tube2	Dry Oxidation	Tempress 6304 4-Stack Furnace	Dry oxidation  (950C-1050C) in Oxygen
FURN2-Tube3	Low Temp Anneal and High Temp Anneal for P-type doping	Tempress 6304 4-Stack Furnace	Low Temperature Annealing (400C-600C) in Nitrogen or Forming Gas and High Temp Annealing (up to 1050C) in Nitrogen of P-type substrates
FURN3	Furnace - Hydrogen anneal	ATS Series 3210	Annealing in Hydrogen, Nitrogen, or vacuum environments
GLOVE1	Glove Box	MBraun Labmaster 130	Performing processes in an inert environment
HOT1	Digital Hot Plate	Tek-Vac PRC-2000	Controlled baking and curing of photoresist materials
NANO1	Film Thickness Measurement	Nanometrics 210	Film thickness measurements up to 50mm
OVEN2	Bake Oven	Thermo Scientific Lindberg/Blue M General-Purpose Oven	Annealing, baking and curing up to 260C in air
OVEN3	Vacuum Bake Oven	YES - 450PBA	Vacuum and nitrogen baking and curing.
PECVD1	Plasma Enhanced Chemical Vapor Deposition System	Advanced Vacuum Vision 310	PECVD deposition of Oxide, Nitride, and Oxynitride films
PHOTO1	Mask Aligner	Suss MicroTec MJB3	Photolithographic patterning
PHOTO2	Frontside/Backside Mask Aligner	Karl Suss MA6/BA6	For Topside or Backside photo alignment and exposure.
PROBE1	Probe Station	Signatone S-1160A-5	The probe station consists of a manual probe system with 4 indepedent probe micromanipulators. It is configured with a parametric analyzer and a LCR meter for measuring current, voltage, resistance, capacitance, and conductance of devices and structures. This system also includes a 4 point resistivity probing system for making sheet-resistance and resistivity measurements of substrates and films.
PROF2	Profilometer	Veeco Dektak 150	Surface profiling and step height measurements
RIE1	Oxide/Nitride/Polymer Reactive Ion Etcher	Trion Technology Phantom II	Reactive Ion Etching (RIE) of oxide, nitride, and polymer films with fluorine and oxygen chemistries
RIE2	III-V Reactive Ion Etcher	Trion Technology Minilock II	Reactive Ion Etching (RIE) of compound III-V semiconductors using chlorine and bromine based chemistries
RTA1	Rapid Thermal Anneal System	Jipelec JetFirst 100	Rapid thermal annealing up to 1000C in air, vacuum, N2, or forming gas (N2/H2)
SCOPE1	Microscope w/ camera (manual)	Nikon Eclipse ME600	Optical Microscopy
SCOPE3	Fluorescence Microscope w/camera	Zeiss AxioImager	Fluorescence and Optical Microscopy
SCOPE4	Nomarski Microsope w/camera	Zeiss AxioImager	BF, DF, and Nomarski optical microscopy
SOLVHOOD1	Small Solvent Chemical Hood	Air Control Solvent Hood	For solvent chemical processing
SOLVHOOD2	Large ADA Solvent Chemical Hood	Air Control Solvent Hood	For solvent chemical processing (including ultrasonics)
SPUT2	RF Dielectric Sputter System	Kurt Lesker PVD 75	RF sputter coating of dielectric materials
SPUT3	DC Sputter System	Kurt Lesker PVD 75	DC sputter coating of metals